• Clean Skin Technology Pore Minimising Mask

Clean Skin Technology Pore Minimising Mask


Exfoliation is essential for a fresh and clear complexion; used regularly this mask will visibly improve dull and lifeless skin. With crushed diamonds, finely ground to remove dead skin. Refines pores instantly and leaves skin smooth, soft and radiant. For all skin types. Glycolic acid gently removes the build-up of dead skin cells from the surface of the skin and penetrates pores to unblock them and clear oil, dead cells and debris, for deeper, yet gentle, exfoliation. Salicylic acid, derived from the bark of the Willow tree, prevents pores from blocking, reduces sebum production, anti-bacterial. Retinyl Palmitate stimulates cell turnover. An amazing skin mask that gently resurfaces, to reveal healthy smooth velvety skin.

DIRECTIONS: After cleansing, apply mask to dry skin. Leave on for ten minutes, then gently massage before removing with a clean damp facecloth. Follow with moisturiser. Use twice weekly for best results.

INGREDIENTS: Aqua, Glycolic Acid, Isopropyl Palmitate, Ethylene/Propylene/Styrene Copolymer, Butylene/Ethylene/Styrene Copolymer, BHT, Kaolin, Caprylic/Capric Triglyceride, Glyceryl Stearate SE, Cetyl Alcohol, Glycerin, Propylene Glycol, Sodium Magnesium Silicate, Panthenol, Glyceryl Stearate, PEG-100 Stearate, Sodium Cocoyl Isethionate, Xanthan Gum, Hydrolyzed Corn Starch, Salicylic Acid, Cocamidopropyl Dimethylamine, Polyquaternium-67, Hydrated Silica, Cera Alba, Aloe Barbadensis Leaf Juice, Phenoxyethanol, Decylene Glycol, Caprylyl Glycol, Triethanolamine, Camellia Sinensis Leaf Extract, Citric Acid, Sodium Benzoate, Potassium Sorbate, Cinnamomum Zeylanicum Leaf Oil, Retinyl Palmitate, Hydrolyzed Silk, Eugenol.